Driven by the rapid expansion of AI infrastructure, demand for Fiber Array Units (FAUs) and other passive optical components ...

The wire blank shoots from the drawing die which molds it into the desired shape. Up to ten meters per second, the workpiece is fast – and thus can keep pace with world-class runners like Usain Bolt.

Rochester Institute of Technology recently installed a MIRTEC MV3 OMNI automated, optical inspection machine in its Center for Electronics Manufacturing and Assembly (CEMA). The equipment enables ...

Applied Materials has launched a new generation of optical semiconductor wafer inspection machines that incorporate big data and AI techniques. These multimillion-dollar machines are used in chip ...

Defect inspection scientists from Huazhong University of Science and Technology, Harbin Institute of Technology and The Chinese University of Hong Kong make a thorough review of new perspectives and ...

MINNEAPOLIS--(BUSINESS WIRE)--Nordson Test & Inspection today announced that it has earned the Prime Award, which is the top honor, at the Step-by-Step Excellence Awards (SbSEA) for its groundbreaking ...

As anyone who has ever assembled a run of PCBs will tell you, quality inspection of solder joints can be a difficult process. Even under a microscope their appearances can be deceptive, and one silver ...

Optical inspection equipment for packaging was displayed at INTERPHEX 2015. Demand remains high for quality-control technology, driven by high-profile recalls, revised guidelines like the United ...

The Five-hundred-meter Aperture Spherical radio Telescope (FAST), also known as the “China Sky Eye”, is the world's largest single-dish radio telescope. Its reflector is a partial sphere of radius ...

In this interview, Tim Skunes from CyberOptics Corporation talks to AZoM about their 3D optical inspection technology, and how it can be used to solve challenges in SMT electronics manufacturing.

As the Extreme Ultraviolet (EUV) lithography ecosystem is being actively mapped out to enable sub-7nm design rule devices, there is an immediate and imperative need to identify the EUV reticle (mask) ...